Cerium oxide polishing liquid also called cerium oxide polishing solution.
Main Components: Using cerium oxide as the abrasive, usually including water-based carrier liquid and some additives.
Appearance: Generally a uniform milky liquid.
Integrated Circuit Manufacturing: In processes such as shallow trench isolation (STI) and interlayer dielectric (ILD), wafer surfaces can be polished to achieve ultra-high surface flatness and extremely low roughness, meeting the high-precision requirements of chip manufacturing.
Optical Industry: Suitable for polishing high-precision optical instruments, optical lenses, liquid crystal displays, microcrystalline glass substrates, etc., effectively improving the surface quality of optical components, reducing light scattering and reflection, and enhancing imaging quality.
Electronic Information Industry: Can be used for polishing integrated circuit photomasks, multi-core fiber optic connectors, etc., ensuring their surfaces meet high precision and smoothness standards, thereby guaranteeing the accuracy and stability of signal transmission.
Automotive Glass and Other Glass Products: It can remove oil films from automotive glass, repair minor scratches, and enhance surface smoothness. It can also be used for polishing and maintaining glass surfaces such as household windows and mirrors.
Particle Size: The particle size range of common products varies from 0.05μm to 1.5μm, with different models suitable for various polishing applications. For example, the SHNP-08 model with a particle size of 0.05–0.09 μm is suitable for DSTI-CMP, while models with particle sizes of 0.3–0.4 μm and above are primarily used for polishing high-precision optical instruments, multi-core fiber optic connectors, and similar applications.
Concentration: The mass fraction typically ranges from 20% to 40%, though it can be adjusted according to user requirements.
pH Value: Generally between 7 and 9, with a weak alkaline nature. However, some products can have their pH values adjusted between 3 and 13 to accommodate different polishing requirements.
High Polishing Efficiency: Cerium oxide has excellent cutting performance, enabling rapid removal of minor surface defects from materials and improving polishing efficiency. For example, in the polishing of optical glass, it can significantly reduce polishing time.
High Precision: Uniform particle dispersion and emulsion consistency effectively prevent surface scratches caused by particle agglomeration during polishing, enabling high-precision polishing with very low surface roughness. It is suitable for polishing optical lenses, integrated circuit photomasks, and other components with extremely high surface precision requirements.
Good Suspension: It does not easily settle, maintaining good stability during storage and use. It is convenient to use, requiring no frequent stirring or concern about settling issues, ensuring consistent performance of the polishing solution.
Good Chemical Stability: It has certain chemical stability, maintaining relatively stable performance under different environmental conditions. It does not easily react chemically with the polished material. In addition to having good polishing effects on materials like silica, it also has good adaptability to various metals and non-metals.
Environmental Protection and Safety: It does not produce dust, avoiding environmental pollution and harm to human health. Some products do not contain harmful additives such as sulfur, phosphorus, or chlorine, making them more environmentally friendly.
Storage: Store at temperatures above 0°C to prevent caking. Storage below 0°C may result in the formation of non-redispersible lumps, rendering the product ineffective.
Packaging: Typically available in 1L/bottle, 5L/bottle, 20L/bottle, etc., custom packaging can also be provided upon customer request.
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In case of slight precipitation, it is recommended to shake well before use.
When using, according to the needs of different industries, it can be diluted with filtered clean water at different concentrations to prepare different concentrations.
To prevent minor sedimentation, it is recommended to shake well before use.
When using, it can be diluted with filtered clean water at different concentrations according to the needs of different industries to prepare solutions of varying concentrations.
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In case of slight precipitation, it is recommended to shake well before use.
When using, according to the needs of different industries, it can be diluted with filtered clean water at different concentrations to prepare different concentrations.
To prevent minor sedimentation, it is recommended to shake well before use.
When using, it can be diluted with filtered clean water at different concentrations according to the needs of different industries to prepare solutions of varying concentrations.
{/pboot:if}
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